Original Article(論文)

  1. NT Luong, H Okumura. KN Ishihara, E. Yamasue, Structure and catalytic behavior of CuO-CeO2 prepared by High-Energy Ball Milling, Royal Society Open Science, RSOS-181861.R1, Published:06 February 2019, Volume 6, Issue 2
  2. Hsin-Tien Lin, Kenichi Nakajima, Eiji Yamasue, Keiichi N. Ishihara, An optimum treatment for waste electronic home appliance in remote area: The case of Kinmen, Taiwan, Waste Management, Volume 89, 2019, Pages 379-385
  3. Yutaka Akitsu, Keiichi N. Ishihara “Energy Literacy Assessment: A Comparative Study of Lower Secondary School Students in Thailand and Japan”, International Journal of Educational Methodology. Volume 5 Issue 2 (May 2019), Pages: 183-201
  4. Kairi Hamada, Takaya Ogawa, Hideyuki Okumura, and Keiichi N. Ishihara: The effect of substrate roughness on the properties of RF sputtered AZO thin film. MRS Communications (2019), 9, 697–701; doi:10.1557/mrc.2019.66
  5. Takaya Ogawa, Hidenori Ohashi, Takanori Tamaki, Takeo Yamaguchi “Proton Diffusion Facilitated by Indirect Interactions Between Proton Donors Through Several Hydrogen Bonds”, Chemical Physics Letters, 2019, 731, 136627.
  6. Maria R H Takeuchi, Tatsuya Hasegawa, Susie M L Hardie, Linda E McKinley, Keiichi N Ishihara “Leadership for Management of High-Level Radioactive Waste in Japan” Environmental Geotechnics 0 (0), 1-10, (2019) https://doi.org/10.1680/jenge.19.00007
  7. Fahmi Machda, Takaya Ogawa, Hideyuki Okumura, Keiichi N Ishihara, “Evolution and Recovery of Electrical Property of Reactive Sputtered Al‐Doped ZnO Transparent Electrode Exposed to Harsh Environment”, Phys. Status Solidi A2019, 1900519
  8. Fahmi Machda, Takaya Ogawa, Hideyuki Okumura, Keiichi N. Ishihara, “Damp Heat Durability of Al-Doped ZnO Transparent Electrodes with Different Crystal Growth Orientations”, ECS J. Solid State Sci. Technol. 2019 volume 8, issue 12, Q240-Q244

International Conference(国際学会)

  1. K. N. Ishihara, “Issues surrounding FiT Acceleration in Japan’s RE Implementation [Keynote]”. The 2nd Jeju Naional University – Ajou University International Symposium, May 16-7, 2019, Jeju, Korea
  2. Fahmi Machda, Takaya Ogawa, Hideyuki Okumura, and Keiichi N. Ishihara: Development of Carrier Concentration and Its Effects on the Electrical Stability of Al- doped ZnO Transparent Electrode in Harsh Environment, Compound Semiconductor Week 2019, May 19-23, 2019, Nara, Japan
    • Machda, F.; Ogawa, T.; Okumura, H.; Ishihara, K. N. In Development of Carrier Concentration and Its Effects on the Electrical Stability of Al-doped ZnO Transparent Electrode in Harsh Environment, 2019 Compound Semiconductor Week (CSW), 19-23 May 2019; 2019; pp 1-1.
  3. F. Machda, T. Ogawa, H. Okumura, K. N. Ishihara, Effects of Sputtering Gas on Crystal Growth Orientations and Durability of Al-Doped ZnO Transparent Electrodes in Harsh Environment, THE 26th INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES, July 2-5, 2019, Kyoto, Japan
    • Machda, F., Ogawa, T., Okumura, H., & Ishihara, K. N. (2019). Effects of sputtering gas on crystal growth orientations and durability of al-doped ZnO transparent electrodes in harsh environment. Paper presented at the AM-FPD 2019 – 26th International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, Proceedings, doi:10.23919/AM-FPD.2019.8830628
  4. K. N. Ishihara “Japan Solar PV manufacturing in the past and future”, International Scientific Forum (ISF2019), 16-17, Dec. 2019, Melaka, Malaysia
  5. K. N. Ishihara and S. M. G. Dumlao, “Marginal Cost of Solar PV Implementation Caused by Curtailment in Kyushu Region in Japan”, 5th International Workshop on Clean Energy Development in Asian Cities, Dec. 20, 2019, Kyushu University, Japan

Domestic Conference(国内学会)

  1. 奥村 英之, 濱田 海里, 小川 敬也, 石原 慶一, RFスパッタ法で作製したAZO透明導電膜特性における基板表面ラフネスの影響, 10p-W641-2 [2019年3月10日], 第66回応⽤物理学会春季学術講演会, 東京工業大学 大岡山キャンパス, 2019年3月9日~12日
  2. 小川 敬也, 磯野 航也, 奥村 英之, 石原 慶一, ボールレスミリングにおけるプラスチックを利用した金属粉末表面の窒化, [2019年10月23日], 粉体粉末冶金協会2019年度秋季大会 (第124回講演大会)3-31A, 名古屋大学 豊田講堂, 2019年10月22日~24日
  3. 奥村 英之, 高木 宣俊, 小川 敬也, 石原 慶一, スピンバルブライク複合膜磁気構造による非磁性薄膜物性制御の挑戦, 18p-PB1-14 [2019年9月18日], 第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス, 2019年9月18日~21日



Patent: No. 21348 (Vietnam) Phương pháp phủ lớp xúc tác lên bề mặt lõi kim loại nền có mật độ lỗ cao bằng cáck phủ quay (The method of coating the catalyst layer on the surface of the metal core has a high hole density with the rotating coating), Nguyen The Luong, Keiichi N. Ishihara, 26/05/2017 (application), 46329/QD-SHTT (decision number), 10/06/2019