Following original article by Seon-Hong Lee, Eiji Yamasue, Hideyuki Okumura, Keiichi N. Ishihara has been published in Applied Surface Science.

修了生のSeon-Hong Lee博士らによる次の論文がApplied Surface Science誌に掲載されました．

Seon-Hong Lee, Eiji Yamasue, Hideyuki Okumura, Keiichi N. Ishihara: “Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air”, Applied Surface Science, Vol.324, (2015), pp.339-348